Substrate effects on the formation of flat Ag films on (110) surfaces of III-V compound semiconductors

Ag films grown at 135 K on (110) surfaces of III-V compound semiconductors and annealed at room temperature are investigated by scanning tunneling mic roscopy and low-energy electron diffraction. Ag films on Ga-V semiconductor s are well ordered, atomically hat, and exhibit a specific critical thickne ss, which is a function of the substrate material. Films grown on In-V semi conductors are still rather flat, but significantly more disordered. The (1 11) oriented Ag films on III-arsenides and III-phosphides exhibit a clear t wofold superstructure. Films on m-antimonides exhibit threefold low-energy electron diffraction images. The morphology of the Ag films can be explaine d on the basis of the electronic growth mechanism. [S0163-1829(99)10831-2].