Adsorption structure of formic acid on Si(100) studied by surface NEXAFS

Citation
H. Ikeura-sekiguchi et T. Sekiguchi, Adsorption structure of formic acid on Si(100) studied by surface NEXAFS, SURF SCI, 435, 1999, pp. 549-553
Citations number
30
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
SURFACE SCIENCE
ISSN journal
00396028 → ACNP
Volume
435
Year of publication
1999
Pages
549 - 553
Database
ISI
SICI code
0039-6028(19990802)435:<549:ASOFAO>2.0.ZU;2-D
Abstract
The structure of the surface formate chemisorbed on Si(100) at 300 K was st udied by near edge X-ray absorption fine structure (NEXAFS) at the carbon K -edge. By probing the incidence-angle-dependent NEXAFS spectra, it was dete rmined that the CDO group bond of the surface formate is tilted away from t he surface normal by an average angle of 21 +/- 2 degrees. This geometry is analogous to the dihedral angle (21 degrees) of the O=C-O-Si group of sily l formate in the gas phase. This finding indicates that the surface formate and the gas-phase silyl formate have similar steric structures. It could b e expected that the electronic structure of the chemisorbed formate is also similar to that of the gas-phase silyl formate, (C) 1999 Elsevier Science B.V. All rights reserved.