Permanent holographic recording in indium oxide thin films using 193 nm excimer laser radiation

Citation
S. Pissadakis et al., Permanent holographic recording in indium oxide thin films using 193 nm excimer laser radiation, APPL PHYS A, 69(3), 1999, pp. 333-336
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
ISSN journal
09478396 → ACNP
Volume
69
Issue
3
Year of publication
1999
Pages
333 - 336
Database
ISI
SICI code
0947-8396(199909)69:3<333:PHRIIO>2.0.ZU;2-E
Abstract
Permanent holographic recording in sputtered indium oxide (InOx) thin films is demonstrated, using ultraviolet radiation at 193 nm emitted by an ArF e xcimer laser. Steady-state refractive index changes of up to 5 x 10(-3) are calculated from the measured diffraction efficiency of a HeNe laser probe beam. The recorded gratings exhibit a dynamic behaviour that relaxes to a s teady-state value that depends on the oxygen partial pressure used during g rowth and on the recording beam intensity. The observed behaviour is explai ned in terms of laser-induced structural changes.