Fabrication of 3D photonic crystals by autocloning and its applications

Citation
S. Kawakami et al., Fabrication of 3D photonic crystals by autocloning and its applications, ELEC C JP 2, 82(9), 1999, pp. 43-52
Citations number
25
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
ELECTRONICS AND COMMUNICATIONS IN JAPAN PART II-ELECTRONICS
ISSN journal
8756663X → ACNP
Volume
82
Issue
9
Year of publication
1999
Pages
43 - 52
Database
ISI
SICI code
8756-663X(199909)82:9<43:FO3PCB>2.0.ZU;2-6
Abstract
3D photonic crystals can produce a number of fascinating optical devices ut ilizing the band gap, the dispersive passband, and unisotropic band structu re. We previously proposed a process for fabricating a 3D periodic nanostru cture which can behave as photonic crystals. The key technique in the proce ss is the deposition of a multilayer by bias sputtering replicating periodi cally a corrugated layer pattern, which is named the autocloning effect. Th is paper reviews our recent works on 3D photonic crystals: the mechanism of the autocloning effect, propagation analysis in the 3D photonic crystal by an FDTD method, and applications such as plane-normal waveguides or wavele ngth-selective filters. (C) 1999 Scripta Technica, Electron Comm Jpn Pt 2, 82(9): 43-52, 1999.