Transferred-substrate InP-based heterostructure barrier varactor devices ar
e reported which have been fabricated on glass substrate following a novel
epitaxial layer transfer technique utilising the negative photoresist SU-8.
The transferred devices exhibit a leakage current of 4.5A/cm(2) at 10V, a
zero-bias capacitance of 1fF/mu m(2) and a capacitance ratio of 5:1.