Yc. Wang et al., Demonstration of submicron depletion-mode GaAs MOSFET's with negligible drain current drift and hysteresis, IEEE ELEC D, 20(9), 1999, pp. 457-459
We successfully fabricated submicron depletion-mode GaAs MOSFET's with negl
igible hysteresis and drift in drain current using Ga2O3(Gd2O3) as the gate
oxide. The 0.8-mu m gate-length device shows a maximum drain current densi
ty of 450 mA/mm and a peak extrinsic transconductance of 130 mS/mm. A short
-circuit current gain cutoff frequency (f(T)) of 17 GHz and a maximum oscil
lation frequency (f(max)) of 60 GHz were obtained from the 0.8 mu m x 60 mu
m device. The absence of drain current drift and hysteresis along with exc
ellent characteristics in the submicron devices is a significant advance to
ward the manufacture of commercially useful GaAs MOSFET's.