Demonstration of submicron depletion-mode GaAs MOSFET's with negligible drain current drift and hysteresis

Citation
Yc. Wang et al., Demonstration of submicron depletion-mode GaAs MOSFET's with negligible drain current drift and hysteresis, IEEE ELEC D, 20(9), 1999, pp. 457-459
Citations number
11
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE ELECTRON DEVICE LETTERS
ISSN journal
07413106 → ACNP
Volume
20
Issue
9
Year of publication
1999
Pages
457 - 459
Database
ISI
SICI code
0741-3106(199909)20:9<457:DOSDGM>2.0.ZU;2-P
Abstract
We successfully fabricated submicron depletion-mode GaAs MOSFET's with negl igible hysteresis and drift in drain current using Ga2O3(Gd2O3) as the gate oxide. The 0.8-mu m gate-length device shows a maximum drain current densi ty of 450 mA/mm and a peak extrinsic transconductance of 130 mS/mm. A short -circuit current gain cutoff frequency (f(T)) of 17 GHz and a maximum oscil lation frequency (f(max)) of 60 GHz were obtained from the 0.8 mu m x 60 mu m device. The absence of drain current drift and hysteresis along with exc ellent characteristics in the submicron devices is a significant advance to ward the manufacture of commercially useful GaAs MOSFET's.