Molecular dynamics study of thermally induced shear strain in nanoscale copper

Citation
P. Heino et E. Ristolainen, Molecular dynamics study of thermally induced shear strain in nanoscale copper, IEEE T AD P, 22(3), 1999, pp. 510-514
Citations number
30
Categorie Soggetti
Material Science & Engineering
Journal title
IEEE TRANSACTIONS ON ADVANCED PACKAGING
ISSN journal
15213323 → ACNP
Volume
22
Issue
3
Year of publication
1999
Pages
510 - 514
Database
ISI
SICI code
1521-3323(199908)22:3<510:MDSOTI>2.0.ZU;2-5
Abstract
Thermally induced strain and stress were calculated in a nanoscale copper s ystem using the molecular dynamics method. The shear strain in the system w as generated by a mismatch in the coefficients of thermal expansion between the materials surrounding it. Plastic deformation mechanisms, stress conce ntration and stress relaxation were studied. The results show that initiall y the stress is concentrated in the corners of the system, as suggested hy other studies. However, later when the structure has been plastically defor med, high stress regions are found in the center of the system.