Deposition kinetics of tin-lead alloy on rotating disk electrode in methane sulfonate bath

Citation
Cs. Chen et al., Deposition kinetics of tin-lead alloy on rotating disk electrode in methane sulfonate bath, J CH INST C, 30(3), 1999, pp. 199-206
Citations number
29
Categorie Soggetti
Chemical Engineering
Journal title
JOURNAL OF THE CHINESE INSTITUTE OF CHEMICAL ENGINEERS
ISSN journal
03681653 → ACNP
Volume
30
Issue
3
Year of publication
1999
Pages
199 - 206
Database
ISI
SICI code
0368-1653(199906)30:3<199:DKOTAO>2.0.ZU;2-9
Abstract
This study examined the electrochemical behavior of electrodeposition of ti n, lead, and tin-lead alloys on a rotating disk electrode in methane sulfon ate acid solution (MSA). Also investigated herein was how cathodic potentia l, rotating speed and concentration influence the composition of deposits. When the lead content in a bath was controlled at 0.0075M and exceeded 25mo l. % of the total metal ion content, lead deposited preferentially. In a ba th below 25mol. % lead, the deposit's major component was tin. At approxima tely 25mol. % lead, the deposit had the same ratio of tin and lead as in th e solution. In this case, the deposit's composition became independent of t he applied potential.