Synthesis and lithographic characterization of poly[(dihydrocarveol)-co-(1,1-dimethylethyl bicyclo[2.2.1]hept-5-ene-2-carboxylate)-co-(maleic anhydride)]

A new ArF single-layer resist polymer, poly(dihydrocarveol-co-1,1-dimethyle thyl bicyclo[2.2.1]hept-5-ene-2-carboxylate-co-ma anhydride) has been synth esized by radical polymerization. The molar composition of synthesized resi st polymer was confirmed by elemental analysis. The obtained molar composit ion was 0.25:0.35:0.40. This resist polymer was found to be stable up to 23 0 degrees C, but above 250 degrees C it underwent rapid thermal deprotectio n of the tert-butyl groups by releasing carbon dioxide and 2-methylpropene. The deprotection temperature was established by DSC and TGA. Using the res ist, 0.14 mu m L/S pattern was obtained at 26 mJ/cm(-2) doses, using an ArF stepper and the developer of 2.38wt% tetramethyl ammonium hydroxide aqueou s solution. (C) 1999 Society of Chemical Industry.