Measurement of forces during the modification of C60 islands

Citation
Ma. Lantz et al., Measurement of forces during the modification of C60 islands, SURF SCI, 437(1-2), 1999, pp. 99-106
Citations number
21
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
SURFACE SCIENCE
ISSN journal
00396028 → ACNP
Volume
437
Issue
1-2
Year of publication
1999
Pages
99 - 106
Database
ISI
SICI code
0039-6028(19990820)437:1-2<99:MOFDTM>2.0.ZU;2-U
Abstract
A UHV atomic force microscope with a conducting tip is used to measure the tip-sample conductance as a function of the applied force on well-ordered, monolayer islands of C60 on Cu(111). By imaging the sample before and after each force-distance experiment, it was possible to investigate the forces required for the removal of individual C60 molecules from the islands. The removal of C60 occurs near defects or edges of the C60 islands and requires an applied force of 5-20 nN, which corresponds to applied pressures of ord er 1 GPa. In addition, it was possible to investigate the strength of the C 60 film on the molecular scale. It was found that the mechanical stiffness of a C60 molecule is of order 6 N/m and the islands appear to undergo a rev ersible yield process at an applied pressure of around 1.2 GPa. (C) 1999 El sevier Science B.V. All rights reserved.