UV-laser-induced photolysis of trimethyl(vinyloxy)silane for chemical vapour deposition of polysiloxane films

Authors
Ouchi, A Koga, Y Bastl, Z Pola, J
Citation
A. Ouchi et al., UV-laser-induced photolysis of trimethyl(vinyloxy)silane for chemical vapour deposition of polysiloxane films, APPL ORGAN, 13(9), 1999, pp. 643-647
Citations number
31
Categorie Soggetti
Chemistry
Journal title
APPLIED ORGANOMETALLIC CHEMISTRY
ISSN journal
02682605 → ACNP
Volume
13
Issue
9
Year of publication
1999
Pages
643 - 647
Database
ISI
SICI code
0268-2605(199909)13:9<643:UPOTFC>2.0.ZU;2-P
Abstract
The UV-induced photolysis of trimethyl(vinyloxy)silane (TMVSi) induced by A rF laser, affording a multitude of unsaturated hydrocarbons and a solid pol ydimethylsiloxane, represents a convenient process of chemical vapour depos ition in which the silicon of the parent is almost completely utilized for the formation of the solid phase and in which the morphology and compositio n of the films is affected by the configuration of the substrate and laser beam. Copyright (C) 1999 John Wiley & Sons, Ltd.