Reversible gas doping of bulk alpha-hexathiophene

Citation
Jh. Schon et al., Reversible gas doping of bulk alpha-hexathiophene, APPL PHYS L, 75(11), 1999, pp. 1556-1558
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
75
Issue
11
Year of publication
1999
Pages
1556 - 1558
Database
ISI
SICI code
0003-6951(19990913)75:11<1556:RGDOBA>2.0.ZU;2-K
Abstract
The sensitivity of the electrical properties of alpha-hexathiophene single crystals to exposure to air, oxygen, helium, and nitrogen is investigated b y space charge limited current spectroscopy. Whereas no changes are seen in helium and nitrogen atmosphere, the acceptor concentration and trap densit y increase in air or oxygen. Nevertheless, stable equilibrium concentration s, much lower than in thin films, are reached after a few days of exposure and remain unchanged for many months. Therefore, the observed thin film dev ice instabilities and their degradation have to be ascribed to grain bounda ry-enhanced or interface effects. The present results indicate that air-sta ble electronic devices can be prepared from oligothiophenes. (C) 1999 Ameri can Institute of Physics. [S0003-6951(99)00337-X].