Characterization of SiO2 layers thermally grown on 4H-SiC using high energy photoelectron spectroscopy

Citation
Li. Johansson et al., Characterization of SiO2 layers thermally grown on 4H-SiC using high energy photoelectron spectroscopy, APPL SURF S, 150(1-4), 1999, pp. 137-142
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
150
Issue
1-4
Year of publication
1999
Pages
137 - 142
Database
ISI
SICI code
0169-4332(199908)150:1-4<137:COSLTG>2.0.ZU;2-7
Abstract
Si 2p and C 1s core level spectra recorded at different electron emission a ngles from SiO2/SiC samples using a photon energy of 3.0 keV show two compo nents. These are identified as originating from SiO2 and SiC for Si 2p whil e for C 1s they are identified to originate from graphite like carbon and S iC. The relative intensity of these components are extracted and compared t o calculated intensity variations assuming different models for the element al distribution in the surface region. For both samples investigated best a greement between experimental and calculated intensity variations with emis sion angle is obtained when assuming a graphite like layer on top of the ox ide layer. Contribution from carbon at the SiC/SiO2 interface could not be identified. (C) 1999 Elsevier Science B.V. All rights reserved.