Characterisation of RF-sputtered platinum films from industrial productionplants using slow positrons

Authors
Osipowicz, A Harting, M Hempel, M Britton, DT Bauer-Kugelmann, W Trifthauser, W
Citation
A. Osipowicz et al., Characterisation of RF-sputtered platinum films from industrial productionplants using slow positrons, APPL SURF S, 149(1-4), 1999, pp. 198-203
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
149
Issue
1-4
Year of publication
1999
Pages
198 - 203
Database
ISI
SICI code
0169-4332(199908)149:1-4<198:CORPFF>2.0.ZU;2-P
Abstract
Platinum films, used in thin film technology, produced by radio-frequency s putter deposition on aluminium oxide substrates under different conditions, have been studied by positron beam and other techniques, before and after production annealing. The defect structure in the layers has been character ised using both positron Lifetime and Doppler-broadening spectroscopy, and compared with X-ray studies of crystallinity and texture. (C) 1999 Elsevier Science B.V. All rights reserved.