A. Osipowicz et al., Characterisation of RF-sputtered platinum films from industrial productionplants using slow positrons, APPL SURF S, 149(1-4), 1999, pp. 198-203
Platinum films, used in thin film technology, produced by radio-frequency s
putter deposition on aluminium oxide substrates under different conditions,
have been studied by positron beam and other techniques, before and after
production annealing. The defect structure in the layers has been character
ised using both positron Lifetime and Doppler-broadening spectroscopy, and
compared with X-ray studies of crystallinity and texture. (C) 1999 Elsevier
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