Study on the crystallization behavior of amorphous carbon nitride films

Citation
Xc. Xiao et al., Study on the crystallization behavior of amorphous carbon nitride films, CHEM P LETT, 310(3-4), 1999, pp. 240-244
Citations number
13
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
CHEMICAL PHYSICS LETTERS
ISSN journal
00092614 → ACNP
Volume
310
Issue
3-4
Year of publication
1999
Pages
240 - 244
Database
ISI
SICI code
0009-2614(19990903)310:3-4<240:SOTCBO>2.0.ZU;2-Q
Abstract
Amorphous carbon nitride films were first prepared by DC reactive magnetron sputtering, followed by heat treatment under protective nitrogen. The ensu ing thermal effects were analyzed by DTA-TG, XRD and XPS. The results showe d that heat treatment above 1100 degrees C could induce the transition from an amorphous to a crystalline state of carbon nitride films. Apparent diff raction peaks of alpha-C3N4 appeared in the XRD spectra of samples heat-tre ated at 1180 degrees C. XPS results further supported the analysis of cryst allization of the films after heat treatment. (C) 1999 Elsevier Science B.V . All rights reserved.