EFFECT OF PHOSPHITE IONS ON THE KINETICS OF NICKEL DEPOSITION BY HYPOPHOSPHITE

Citation
Nv. Sotskaya et al., EFFECT OF PHOSPHITE IONS ON THE KINETICS OF NICKEL DEPOSITION BY HYPOPHOSPHITE, Russian journal of electrochemistry, 33(5), 1997, pp. 485-489
Citations number
13
Categorie Soggetti
Electrochemistry
ISSN journal
10231935
Volume
33
Issue
5
Year of publication
1997
Pages
485 - 489
Database
ISI
SICI code
1023-1935(1997)33:5<485:EOPIOT>2.0.ZU;2-D
Abstract
The phosphite ion effect on the rate and mechanism of the Ni-P alloy e lectroless plating is studied systematically. Phosphite ions may both promote and inhibit formation of the Ni-P films, depending on the rati o between the concentrations of the reaction reagents and products. Th e phosphite ion concentration in the solution affects the deposit comp osition or the surface state of layers under deposition, affecting the catalytic properties of the Ni-P deposits. The change in the catalyti c activity has an effect on the limiting stage, leading to a change in the process rate.