Nv. Sotskaya et al., EFFECT OF PHOSPHITE IONS ON THE KINETICS OF NICKEL DEPOSITION BY HYPOPHOSPHITE, Russian journal of electrochemistry, 33(5), 1997, pp. 485-489
The phosphite ion effect on the rate and mechanism of the Ni-P alloy e
lectroless plating is studied systematically. Phosphite ions may both
promote and inhibit formation of the Ni-P films, depending on the rati
o between the concentrations of the reaction reagents and products. Th
e phosphite ion concentration in the solution affects the deposit comp
osition or the surface state of layers under deposition, affecting the
catalytic properties of the Ni-P deposits. The change in the catalyti
c activity has an effect on the limiting stage, leading to a change in
the process rate.