Ym. Loshkarev et al., THE ROLE OF STRUCTURE AND REACTIVITY OF SURFACTANTS IN HYDROGEN ABSORPTION DURING CADMIUM PLATING, Russian journal of electrochemistry, 33(5), 1997, pp. 494-498
The effect of thiourea and its derivatives on hydrogen absorption in t
he substrate during cadmium plating is studied. The mechanism of the a
ction of additives as inhibitors of hydrogen absorption is elucidated.
It is shown that, on the basis of quantum-chemical calculations of el
ectronic parameters of molecules, one can predict the effectiveness of
the inhibiting action of surfactants, the ratio between different for
ms of hydrogen in metals, and the mechanism of changes in the macrophy
sical properties of the substrate.