EXACT RESULTS FOR SURFACE DEPOSITION WITH PRECURSOR LAYER DIFFUSION

An accelerated random sequential adsorption process is studied as a mo del of chemisorption on a line with precursor layer diffusion. In this process if the position first selected for deposition is occupied the n the particle diffuses and is absorbed on the first vacant position i t visits. For k-mer deposition exact results are obtained for the gap distribution function. Physically measurable quantities such as the av erage island size and the probabilities of island nucleation, growth a nd coagulation are calculated as a function of coverage and the satura tion coverage is calculated as a function of k. The continuum version of this model is also considered and potential applications of the mod els are discussed.