K. Wagatsuma, Analytical performance of high-voltage neon plasma in glow discharge optical emission spectrometry, FRESEN J AN, 364(8), 1999, pp. 780-782
In a high-voltage Ne glow discharge plasma (Ne-GDP), calibration factors as
well as the limit of determination were compared between atomic resonance
lines and singly-ionized lines of copper and aluminium in optical emission
spectrometry. These elements have intense ionic lines which are excited by
resonance charge-transfer collisions of Ne ions. The ionic lines gave bette
r detection sensitivity in the Ne-GDP, whereas the atomic resonance lines w
ere commonly employed as analytical Lines in the other plasma sources such
as Ar-GDP and ICP. The limit of determination was 1.3 x 10(-3) mass % for t
he Cu II 248.58 nm line and 1.0 x 10(-3) mass % Al for the Al II 358.66 nm
Line at a discharge parameter of 1.60 kV/36 mA.