Analytical performance of high-voltage neon plasma in glow discharge optical emission spectrometry

Authors
Citation
K. Wagatsuma, Analytical performance of high-voltage neon plasma in glow discharge optical emission spectrometry, FRESEN J AN, 364(8), 1999, pp. 780-782
Citations number
12
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences
Journal title
FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY
ISSN journal
09370633 → ACNP
Volume
364
Issue
8
Year of publication
1999
Pages
780 - 782
Database
ISI
SICI code
0937-0633(199908)364:8<780:APOHNP>2.0.ZU;2-4
Abstract
In a high-voltage Ne glow discharge plasma (Ne-GDP), calibration factors as well as the limit of determination were compared between atomic resonance lines and singly-ionized lines of copper and aluminium in optical emission spectrometry. These elements have intense ionic lines which are excited by resonance charge-transfer collisions of Ne ions. The ionic lines gave bette r detection sensitivity in the Ne-GDP, whereas the atomic resonance lines w ere commonly employed as analytical Lines in the other plasma sources such as Ar-GDP and ICP. The limit of determination was 1.3 x 10(-3) mass % for t he Cu II 248.58 nm line and 1.0 x 10(-3) mass % Al for the Al II 358.66 nm Line at a discharge parameter of 1.60 kV/36 mA.