Hydrogen separation in H-2-H2O-HI gaseous mixture using the silica membrane prepared by chemical vapor deposition

Citation
Gj. Hwang et al., Hydrogen separation in H-2-H2O-HI gaseous mixture using the silica membrane prepared by chemical vapor deposition, J MEMBR SCI, 162(1-2), 1999, pp. 83-90
Citations number
16
Categorie Soggetti
Chemistry,"Chemical Engineering
Journal title
JOURNAL OF MEMBRANE SCIENCE
ISSN journal
03767388 → ACNP
Volume
162
Issue
1-2
Year of publication
1999
Pages
83 - 90
Database
ISI
SICI code
0376-7388(19990901)162:1-2<83:HSIHGM>2.0.ZU;2-J
Abstract
Hydrogen separation in H-2-H2O-HI gaseous mixture using the silica membrane prepared by CVD was evaluated aiming at the application for hydrogen iodid e decomposition in the thermochemical IS process. Porous alumina tubes havi ng pore size of 100 nm (M1) and 10 nm (M2) were modified by chemical vapor deposition using tetraethoxysilane as the Si source. Single-component perme ance to He, H-2, and N-2 was measured at 300-600 degrees C. Hydrogen permea nce of the modified membranes at a permeation temperature of 600 degrees C was about 6 x 10(-9) mol/Pa m(2) s. H-2/N-2 selectivities at 600 degrees C were 5.2 and 160 for M1 and M2 membrane, respectively. Separation experimen ts of a H-2-H2O-HI mixture using the modified membranes were carried out at 300-600 degrees C. Hydrogen permeances were almost the same as the single- component permeances, whereas HI permeances were below 1 x 10(-11) mol/Pa m (2) s. The hydrogen permeances were not changed after one day exposure in a mixture of H-2-H2O-HI with a molar composition of 0.23:0.65:0.12 at 450 de grees C. (C) 1999 Elsevier Science B.V. All rights reserved.