Piezoelectric coefficient of GaN measured by laser interferometry

Citation
Cm. Leung et al., Piezoelectric coefficient of GaN measured by laser interferometry, J NON-CRYST, 254, 1999, pp. 123-127
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF NON-CRYSTALLINE SOLIDS
ISSN journal
00223093 → ACNP
Volume
254
Year of publication
1999
Pages
123 - 127
Database
ISI
SICI code
0022-3093(19990901)254:<123:PCOGMB>2.0.ZU;2-Y
Abstract
A Mach-Zehnder type heterodyne interferometer was used to measure the d(33) coefficient of wurtzite gallium nitride (GaN) films. The 140 nm thick GaN film, with a 30 nm thick aluminum nitride (AlN) buffer layer, had been grow n by molecular beam epitaxy (MBE) on (1 0 0) or (1 1 1) silicon substrates. The measurement of the piezoelectric coefficient was made with a spatial r esolution (laser beam diameter) of 100 mu m. Voltage drop across the alumin um nitride buffer layer was estimated and used in calculating the piezoelec tric coefficient of GaN. For rigidly mounted samples, the measured d(33) wa s 2.13 pm/V. (C) 1999 Elsevier Science B.V. All rights reserved.