Electron injection into an ECR ion source magnetic field configuration

The injection of additional electrons from an electron gun into the plasma of an ECR ion source is studied. Electron beams with electron currents up t o 10 mA at energies up to 4000 eV were used for a precision adjustment of t he ECR plasma chamber relatively to the magnetic confinement field and for experimental studies of doping electrons injected from an external electron gun and for studies about the influence of electrons injected into the ECR plasma. The reflecting mode electron (RME) beam was used for the capture o f electrons in the ECR plasma. The observed higher intensity of extracted m ulticharged ions and higher total ion currents were results of this applica tion. (C) 1999 Elsevier Science B.V. All rights reserved.