Og. Schmidt et al., Photoluminescence study of the 2D-3D growth mode changeover for different Ge/Si island phases, PHYS ST S-B, 215(1), 1999, pp. 319-324
We report on a phase transition of Ge/Si islands grown by molecular beam ep
itaxy as a function of growth temperature T-s and its impact on the photolu
minescence properties. At T-s = 600 degrees C islands exhibit large 'dome-l
ike' sizes and small areal densities. Reducing the growth temperature by a
mere 20 degrees C reveals a different island phase which consists of much s
maller pyramidal-like islands with an increased sheet density. Photolumines
cence experiments show that for T-s = 600 degrees C both the wetting layer
and the island related energy transitions are resolved. For the lower growt
h temperature the wetting layer related photoluminescence vanishes during t
he course of island formation.