J. Fraxedas et al., Molecular organic thin films of p-nitrophenyl nitronyl nitroxide: Surface morphology and polymorphism, PHYS ST S-B, 215(1), 1999, pp. 859-863
Highly oriented thin films (thickness approximate to 1 to 2 mu m) of the mo
lecular organic radical p-nitrophenyl nitronyl nitroxide (p-NPNN) have been
grown by thermal evaporation in high vacuum on three different substrates:
NaCl (001), mica, and highly oriented pyrolytic graphite (HOPG). The surfa
ces associated to three polymorphs (alpha, beta and delta) reveal clearly d
ifferentiated nanometer-scale morphologies as evidenced by Tapping Mode Ato
mic Force Microscopy (TMAFM) measurements.