Positronium annihilation in mesoporous thin films

Citation
Dw. Gidley et al., Positronium annihilation in mesoporous thin films, PHYS REV B, 60(8), 1999, pp. R5157-R5160
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B-CONDENSED MATTER
ISSN journal
01631829 → ACNP
Volume
60
Issue
8
Year of publication
1999
Pages
R5157 - R5160
Database
ISI
SICI code
0163-1829(19990815)60:8<R5157:PAIMTF>2.0.ZU;2-K
Abstract
Depth-profiled positronium lifetime spectroscopy is used to probe the pore characteristics (size, distribution, and interconnectivity) in porous, low- dielectric silica films. The technique is sensitive to the entire void volu me, both interconnected and isolated, even if the film is buried beneath a metal or oxide layer. Our extension of a simple quantum mechanical model of Ps annihilation in a pore adequately accounts for the temperature and pore size dependence of the Ps lifetime for pore sizes in the range from 0.1 nm to 600 nm. It is applicable to any porous media. [S0163-1829(99)51932-2].