Plasmon confinement in ultrathin continuous Ag films

Citation
F. Moresco et al., Plasmon confinement in ultrathin continuous Ag films, PHYS REV L, 83(11), 1999, pp. 2238-2241
Citations number
20
Categorie Soggetti
Physics
Journal title
PHYSICAL REVIEW LETTERS
ISSN journal
00319007 → ACNP
Volume
83
Issue
11
Year of publication
1999
Pages
2238 - 2241
Database
ISI
SICI code
0031-9007(19990913)83:11<2238:PCIUCA>2.0.ZU;2-P
Abstract
We investigate the effect of film thickness and granularity on the collecti ve excitation of nanostructured ultrathin Ag films deposited on Si(111)7 x 7 by energy loss spectroscopy and low energy electron diffraction to obtain structural and spectroscopic information. For continuous thin films we fin d that the plasmon frequency at a vanishing wave vector scales with the sur face-to-volume ratio of the grains, i.e., as the Mie resonance of separated clusters, instead of with inverse thickness. This indicates a confinement of the plasmon into single domains, in spite of metallic conductivity.