Citation
Jph. Benschop et al., EUCLIDES: European EUV lithography milestones, SOL ST TECH, 42(9), 1999, pp. 43
Citations number
11
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
SOLID STATE TECHNOLOGY
ISSN journal
0038111X
→ ACNP
Volume
42
Issue
9
Year of publication
1999
Database
ISI
SICI code
0038-111X(199909)42:9<43:EEELM>2.0.ZU;2-H
Abstract
In Europe, the EUCLIDES program has obtained preliminary throughput and cos
t-of-ownership results in its comparison of laser plasma and synchrotron so
urces. In addition, researchers have doubled the EW flux at the wafer to in
crease throughput and have obtained impressive results with optical coating
s and optical substrate fabrication. An EW test bench is now under construc
tion, moving this consortium toward its 2000 goal of beginning assembly of
a beta system.