Investigation of tetrahedral amorphous carbon films using X-ray photoelectron and Raman spectroscopy

Citation
Bk. Tay et al., Investigation of tetrahedral amorphous carbon films using X-ray photoelectron and Raman spectroscopy, SURF INT AN, 28(1), 1999, pp. 231-234
Citations number
22
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
SURFACE AND INTERFACE ANALYSIS
ISSN journal
01422421 → ACNP
Volume
28
Issue
1
Year of publication
1999
Pages
231 - 234
Database
ISI
SICI code
0142-2421(199908)28:1<231:IOTACF>2.0.ZU;2-A
Abstract
Amorphous carbon containing very little hydrogen and having a highly tetrah edral structure has been prepared by the Filtered Cathodic Vacuum Are (FCVA ) technique under different deposition temperatures. Based on Raman measure ment, it was found that the I-D/I-G intensity ratio, the G band peak positi on and the linewidth change with deposition temperature. From XPS measureme nt, it was demonstrated that four Gaussians components were required to hav e a good fit of the C Is spectra of amorphous carbon film from which the re lative concentration of sp(3)/sp(2) hybrids can be determined easily. These observations, together with the carbon network structure deduced from the Raman spectra, demonstrate that deposition temperature is an important fact or in determining him properties such as sp(3) content. Specifically, it wa s observed that the sp(3) content derived from the Raman spectra parameter (I-D/I-G ratio) correlates well with that deduced from the XPS measurement data. Copyright (C) 1999 John Wiley & Sons, Ltd.