Studies of field emission current from amorphous silicon deposited on a tungsten tip

Citation
Rb. Sharma et al., Studies of field emission current from amorphous silicon deposited on a tungsten tip, ULTRAMICROS, 79(1-4), 1999, pp. 131-134
Citations number
12
Categorie Soggetti
Multidisciplinary,"Spectroscopy /Instrumentation/Analytical Sciences
Journal title
ULTRAMICROSCOPY
ISSN journal
03043991 → ACNP
Volume
79
Issue
1-4
Year of publication
1999
Pages
131 - 134
Database
ISI
SICI code
0304-3991(199909)79:1-4<131:SOFECF>2.0.ZU;2-K
Abstract
Field electron emission from an amorphous silicon deposited tungsten tip ha s been studied. The current-voltage (I-V) characteristics corresponding to the as-deposited and annealed states of the emitter were recorded. These ch aracteristics showed semiconducting behaviour. Field emission current fluct uations from the two states were recorded. As-deposited tig shows more spik es in low-field region and a mixture of spikes and steps at higher fields. Fast Fourier Transform analysis of the current signal shows Lorentzian-type of power spectrum which is indicative of bistable traps in a-Si : H. Total emission current level remained almost constant for the entire duration of recording. (C) 1999 Elsevier Science B.V. Ail rights reserved.