Field electron emission from an amorphous silicon deposited tungsten tip ha
s been studied. The current-voltage (I-V) characteristics corresponding to
the as-deposited and annealed states of the emitter were recorded. These ch
aracteristics showed semiconducting behaviour. Field emission current fluct
uations from the two states were recorded. As-deposited tig shows more spik
es in low-field region and a mixture of spikes and steps at higher fields.
Fast Fourier Transform analysis of the current signal shows Lorentzian-type
of power spectrum which is indicative of bistable traps in a-Si : H. Total
emission current level remained almost constant for the entire duration of
recording. (C) 1999 Elsevier Science B.V. Ail rights reserved.