Fluorescence microscopy was used to investigate the origin of strong adsorp
tion sites on silica. Fluorescence from a cationic dye, 1,1'-dioctadecyl-3,
3,3',3'-tetramethylindocarbocyanine perchlorate, was imaged at the chemical
interface between fused silica modified with chlorodimethyloctadecylsilane
and water or acetonitrile, The fluorescence images reveal that the dye ads
orbs strongly at lines and points on the surface. Comparison of an atomic f
orce micrograph and a fluorescence micrograph of the same region show the s
ame features, indicating that strong adsorption occurs at nanometer topogra
phical indentations. Fluorescence recovery after photobleaching shows that
recovery occurs through repopulation of the same adsorption sites. The rate
of adsorption to the sites was found to be much slower for water than for
acetonitrile as the mobile phase. End capping greatly reduces the number of
strong adsorption sites, which indicates that exposed silica is the origin
of irreversible adsorption. Similar but brighter patterns of strong adsorp
tion appear when water is replaced with acetonitrile, and the patterns rema
in obvious even at surface concentrations approaching those used in HPLC. T
he adsorption behavior is the same for pH 7 and pH 2, showing that these to
pographical indentations behave as the putative "active silanols", Since th
e size distribution of the nanometer polishing marks overlap the pore size
distribution of chromatographic silica gel, these results suggest that surf
ace topography is a previously unrecognized factor in the tailing of organi
c bases.