The interplay of sputtering and oxidation during plasma diffusion treatment

Citation
S. Parascandola et al., The interplay of sputtering and oxidation during plasma diffusion treatment, APPL PHYS L, 75(13), 1999, pp. 1851-1853
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
75
Issue
13
Year of publication
1999
Pages
1851 - 1853
Database
ISI
SICI code
0003-6951(19990927)75:13<1851:TIOSAO>2.0.ZU;2-5
Abstract
Metals that form dense native surface oxide layers challenge plasma diffusi on treatment techniques. Experimental results obtained during nitriding of stainless steel from real-time depth-resolved compositional analysis by ela stic recoil detection give insight into the transport kinetics. In agreemen t with semiquantitative considerations on the oxide removal and the oxide g rowth, the interplay of sputtering and oxidation emerges as a key parameter . On this background, suggestions for practical applications and optimizati on of the modification processes are given for different plasma diffusion t reatment techniques. (C) 1999 American Institute of Physics. [S0003-6951(99 )02339-6].