Grain growth in thin-film strontium sulfide electroluminescent phosphors

Citation
Yb. Xin et Cj. Summers, Grain growth in thin-film strontium sulfide electroluminescent phosphors, APPL PHYS L, 75(13), 1999, pp. 1860-1862
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
75
Issue
13
Year of publication
1999
Pages
1860 - 1862
Database
ISI
SICI code
0003-6951(19990927)75:13<1860:GGITSS>2.0.ZU;2-W
Abstract
A comprehensive study of grain growth in strontium sulfide (SrS) thin-film electroluminescent (TFEL) phosphors is reported. It is suggested that the g rain growth during annealing is influenced by the migration of the dopant i on from the grain boundary into a lattice position. The difference in the f ree energy of formation between SrS and the sulfur compounds of the dopants changes the activation energy for the grain boundary movement and promotes the grain growth. This understanding has successfully been used to explain the grain growth phenomena observed in SrS TFEL phosphors with different d opants, such as Cu, Ag, Mn, and Ga. (C) 1999 American Institute of Physics. [S0003-6951(99)03439-7].