Micro-Raman imaging of GaN hexagonal island structures

Citation
M. Holtz et al., Micro-Raman imaging of GaN hexagonal island structures, APPL PHYS L, 75(12), 1999, pp. 1757-1759
Citations number
23
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
75
Issue
12
Year of publication
1999
Pages
1757 - 1759
Database
ISI
SICI code
0003-6951(19990920)75:12<1757:MIOGHI>2.0.ZU;2-4
Abstract
We use Raman scattering to obtain a stress map of lateral epitaxy overgrown GaN. Isolated hexagonal islands are grown by selective area overgrowth wit hout a seed layer. Stress mapping is obtained from shifts in the E-2 phonon . GaN in the aperture area has the greatest biaxial compressive stress, app roximate to 0.18 GPa. The overgrowth region is under slightly smaller stres s, about 0.15 GPa. We attribute marked variations in the A(1)(LO) phonon in tensity to spatial variations in the free carrier concentration. This is fo und to be small in the aperture region and high in the lateral overgrowth. The position-dependent presence of the lower coupled plasmon-phonon band is consistent with this interpretation. (C) 1999 American Institute of Physic s. [S0003-6951(99)03338-0].