Submicron laser writing on diamond

Citation
S. Gloor et al., Submicron laser writing on diamond, DIAM RELAT, 8(10), 1999, pp. 1853-1856
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
DIAMOND AND RELATED MATERIALS
ISSN journal
09259635 → ACNP
Volume
8
Issue
10
Year of publication
1999
Pages
1853 - 1856
Database
ISI
SICI code
0925-9635(199910)8:10<1853:SLWOD>2.0.ZU;2-J
Abstract
A synthesized HPHT IIb diamond plate is irradiated with a KrF excimer laser (wavelength;lambda = 248 nm, pulse duration tau = 20 ns). The beam is focu sed onto the surface with an ultrafluar objective [numerical aperture (NA) = 1]. The quality of the optical imaging system is first investigated by pe rforming atomic force microscopy (AFM) measurements on holes ablated into P erspex (PMMA). On diamond, holes are drilled at various pulse energies down to values slightly above the ablation threshold. The hole depth and width are measured by AFM after annealing in air at 600 degrees C during 3 h. Hol es with submicrometre diameters are obtained, and suggestions on how to pro duce even smaller holes are given. (C) 1999 Elsevier Science S.A. All right s reserved.