Morphology and structure of nanoscale Co-Cu multilayers

Nanoscale cobalt-copper multilayers prepared by pulsed laser deposition on oxidized silicon substrate were investigated by means of transmission elect ron microscopic (TEM) methods combined with energy dispersive X-ray spectro scopy. The multilayers proved to be polycrystalline with grain sizes betwee n some nanometers and the stack thickness. The topmost copper layer was inc omplete with droplets up to 1 mu m. For single layer thicknesses greater th an 4 nm it could be shown that the structure of the layer stacks was face c entred cubic with hexagonal close packed parts in the cobalt layers.