Growth of oxide buffer layers and YBCO films on various substrates by pulsed injection CVD

Citation
A. Abrutis et al., Growth of oxide buffer layers and YBCO films on various substrates by pulsed injection CVD, J PHYS IV, 9(P8), 1999, pp. 689-695
Citations number
11
Categorie Soggetti
Physics
Journal title
JOURNAL DE PHYSIQUE IV
ISSN journal
11554339 → ACNP
Volume
9
Issue
P8
Year of publication
1999
Part
2
Pages
689 - 695
Database
ISI
SICI code
1155-4339(199909)9:P8<689:GOOBLA>2.0.ZU;2-E
Abstract
Bilayers composed from a YSZ or CeO2 buffer la,er and a YBCO film were in s itu grown on monocrystalline sapphire, MgO, silicon, vicinally polished sap phire and MgO substrates by single source pulsed injection CVD. Zr, Ce, Y,B a and Cu 2,2,6,6-tetramethyl-3,5-heptandionates dissolved in organic solven t were used for film deposition. CeO2/YBCO bilayers on sapphire were grown epitaxially and exhibited critical current densities up to 10(6) A/cm(2) at 77 K. YSZ and CeO2 buffer layers oil MgO substrates did not improved the p roperties of YBCO layers compared with YBCO films deposited directly on MgO surface; however, interesting microstructural properties of these heterost ructures were found. :Homogeneous YSZ films were also deposited on large Si substrates (3 inches in diameter).