In situ mass spetrometry during laser-induced chemical vapor deposition ofsilicon carbonitride

Mass spectrometry provides a means to study the kinetics of the decompositi on of hexamethyldisilazane (HMDS) in detail. Towards this end, in situ mass spectrometry during Laser-Induced Chemical Vapor Deposition (LCVD) of sili con carbonitride is investigated. The reactant gases, HMDS, and ammonia, ar e heated by a continuous wave CO2-laser in a parallel configuration with th e substrate. In this way, silicon carbonitride deposits are formed at low s ubstrate temperatures (300 degrees C). Insight in the formation of reaction intermediairs during LCVD is obtained. The HMDS molecule splits at the Si- N bonding due to laser radiat::on.