High breakdown n(+)-GaAs/delta(p(+))-GaInP/n-GaAs heterojunction camel-gate FET grown by LP-MOCVD

Citation
Wc. Liu et al., High breakdown n(+)-GaAs/delta(p(+))-GaInP/n-GaAs heterojunction camel-gate FET grown by LP-MOCVD, J PHYS IV, 9(P8), 1999, pp. 1171-1177
Citations number
14
Categorie Soggetti
Physics
Journal title
JOURNAL DE PHYSIQUE IV
ISSN journal
11554339 → ACNP
Volume
9
Issue
P8
Year of publication
1999
Part
2
Pages
1171 - 1177
Database
ISI
SICI code
1155-4339(199909)9:P8<1171:HBNHC>2.0.ZU;2-C
Abstract
This paper reports on the characteristics of n(+)-GaAs/delta(p(+))-GaInP/n- GaAs camel-gate heterojunction field-effect transistor (CAMFET) with the tr iple-step doped-channel. Due to the newly designed structure, the measured gate-drain turn-on and breakdown voltages are as high as 1.6 and 40 V for a fabricated 1x100 mu m(2) device, respectively. Furthermore, the measured m aximum transconductance is 145 mS/mm with the current gain cut-off frequenc y f(T) of 17 GHz and the maximum oscillation frequency f(max) of 33 GHz, re spectively. Based on excellent device characteristics, the studied device s hows a promise for circuit applications.