Wc. Liu et al., High breakdown n(+)-GaAs/delta(p(+))-GaInP/n-GaAs heterojunction camel-gate FET grown by LP-MOCVD, J PHYS IV, 9(P8), 1999, pp. 1171-1177
This paper reports on the characteristics of n(+)-GaAs/delta(p(+))-GaInP/n-
GaAs camel-gate heterojunction field-effect transistor (CAMFET) with the tr
iple-step doped-channel. Due to the newly designed structure, the measured
gate-drain turn-on and breakdown voltages are as high as 1.6 and 40 V for a
fabricated 1x100 mu m(2) device, respectively. Furthermore, the measured m
aximum transconductance is 145 mS/mm with the current gain cut-off frequenc
y f(T) of 17 GHz and the maximum oscillation frequency f(max) of 33 GHz, re
spectively. Based on excellent device characteristics, the studied device s
hows a promise for circuit applications.