Application of Raman spectrometry for the characterization of complex oxide thin films grown by MOCVD

Citation
B. Guttler et al., Application of Raman spectrometry for the characterization of complex oxide thin films grown by MOCVD, J PHYS IV, 9(P8), 1999, pp. 1179-1186
Citations number
34
Categorie Soggetti
Physics
Journal title
JOURNAL DE PHYSIQUE IV
ISSN journal
11554339 → ACNP
Volume
9
Issue
P8
Year of publication
1999
Part
2
Pages
1179 - 1186
Database
ISI
SICI code
1155-4339(199909)9:P8<1179:AORSFT>2.0.ZU;2-Z
Abstract
Thin epitaxial films of complex oxide materials including superconductors R Ba2Cu3O7.delta (R=Ho,Lu), CMR manganites R(1-x)A(x)MnO(3) (R = La, Pr, Nd; A = Ca, Sr), conducting perovskites La0.5Sr0.5CoO3LaNiO3 were prepared by a erosol and flash MOCVD. The application of Raman spectrometry was found to be an unique possibility for a non-destructive control of the oxygen conten t of the material in films (including the analysis of the oxygen isotope co ntent) and the appearance of secondary phases. In particular cases, the pha se analysis can be carried out for very small amounts of impurity phase exc eeding the detection limit provided by other techniques, such as X-ray diff raction or EDX element analysis. Advances in the measurement technique have expanded:facilities of Raman spectrometry to the analysis of perovskite th in films with only minor deviations from a cubic symmetry. As a result, del icate variations of the structure with the composition of thin film perovsk ite-like solid solutions were studied.