In situ monitoring of atmospheric pressure tin oxide CVD using near-infrared diode laser spectroscopy

Citation
Rj. Holdsworth et al., In situ monitoring of atmospheric pressure tin oxide CVD using near-infrared diode laser spectroscopy, J PHYS IV, 9(P8), 1999, pp. 109-113
Citations number
7
Categorie Soggetti
Physics
Journal title
JOURNAL DE PHYSIQUE IV
ISSN journal
11554339 → ACNP
Volume
9
Issue
P8
Year of publication
1999
Part
1
Pages
109 - 113
Database
ISI
SICI code
1155-4339(199909)9:P8<109:ISMOAP>2.0.ZU;2-W
Abstract
In situ near-IR diode laser absorption spectroscopy is a new technique whic h has been used to monitor reaction species involved in the atmospheric pre ssure tin oxide CVD deposition reaction. The system is entirely noninvasive and provides real-time analysis. Preliminary results obtained in the CVD d eposition reaction of tin oxide onto a glass substrate in a small laborator y scale reactor is described. These will illustrate how sensitive the syste m is to small changes in reaction conditions which can then lead to much gr eater control over film qualities. Additionally, the light is easily transm itted through optical fibres to the reactor region to pass directly through the quartz reactor walls.