Modelling of SiC sublimation growth process: Influence of experimental parameters on crystal shape

Citation
A. Pisch et al., Modelling of SiC sublimation growth process: Influence of experimental parameters on crystal shape, J PHYS IV, 9(P8), 1999, pp. 213-219
Citations number
12
Categorie Soggetti
Physics
Journal title
JOURNAL DE PHYSIQUE IV
ISSN journal
11554339 → ACNP
Volume
9
Issue
P8
Year of publication
1999
Part
1
Pages
213 - 219
Database
ISI
SICI code
1155-4339(199909)9:P8<213:MOSSGP>2.0.ZU;2-I
Abstract
Different computational tools help to provide information on the sublimatio n growth of SiC single crystals by the modified-Lely method. Local thermody namic equilibrium calculations coupled to heat and mass transfer can give v aluable data on the growth rate and the shape of the growing crystal. In th is contribution, we focus on the influence of the overall Ar pressure in th e growth cavity on the growing crystal shape for two different cavity geome tries (with and without a screen next to the seed crystal) having similar t emperature distributions. The results of this modelling will be compared to the experiments.