Modelling of nanosecond LCVD of 3D metal micropatterns

Modelling of LCVD of metal film micropatterns under the action of a high-po wer nanosecond pulse UV laser was performed on the basis of the analysis of experimental data, calculation of laser-induced temperature field and mass -transport fluxes. It is shown that the reaction zone is limited in time by the laser-induced temperature pulse. It is stated that continuous metal fi lms of uniform thickness are deposited as a result of laser-induced thermol ysis of the adsorbed layer of the initial molecules, the filling degree of this layer exceeding 1. Spatial and time localisation of the reaction zone is characterised depending on the deposition time at the stages of nuclei f ormation, formation of a continuous metal film, and increase in its thickne ss. The conditions to govern the reaction zone localisation are determined.