Synthesis and characterization of CN thin films by IR laser deposition in a flow reactor

Carbon nitride (CNx) this films were produced by CO2 laser (lambda=10.6 mu m) irradiation of mixtures containing C2H2/N2O/NH3, in a flow reactor, on S i substrates. The experimental parameters (partial concentrations of the re actants, gas flows. total pressure) were chosen in order to maximize the ni trogen incorporation in films. Chemical composition and bonding structure o f the deposited films were investigated by; X-ray photoelectron spectroscop y (XPS). Thus, it was found that nitrogen is chemically bonded to C in sp(2 ) or sp(3) configurations, the NIC ratio (considering only the N atoms bond ed to carbon) being similar to 20%. Scanning electron microscopy (SEM) show s a specific growth morphology, while the transmission electron diffraction (TED) and X-ray diffraction (XRD) analysis revealed that the CN, films wer e crystalline, with diffraction lines that marches rather well with those o f the predicted beta-C3N4 form.