Thin films obtained by plasma polymerization of pyrrole were deposited on d
ifferent substrates. The polymer films were obtained in a R.F. plasma polym
erization reactor from low-pressure vapor of the pyrrole monomer. The R.F.
power and gas pressure were adjusted to obtain optimal deposition rate and
film adhesion to substrates. The film composition was determined using Infr
aRed Transmission and X-ray Photoelectron Spectroscopy (XPS).