Accurate determination of pulsed current waveform in plasma immersion ion implantation processes

This article reports on the measurement of the ion current in plasma immers ion ion implantation. Our simulation results indicate that the total curren t peaks at the end of rise time of the applied voltage. However, our experi mental data acquired using a Rogowski coil and digital oscillator show the highest current at the beginning of the voltage pulse. The discrepancy can be explained by a displacement current attributable to the changing voltage , sheath capacitance, circuit loading effects, as well as secondary electro n emission. (C) 1999 American Institute of Physics. [S0021- 8979(99)02919-9 ].