The initial stages of rhodium deposition on Au(111)

Citation
La. Kibler et al., The initial stages of rhodium deposition on Au(111), J ELEC CHEM, 467(1-2), 1999, pp. 249-257
Citations number
33
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences
Journal title
JOURNAL OF ELECTROANALYTICAL CHEMISTRY
ISSN journal
15726657 → ACNP
Volume
467
Issue
1-2
Year of publication
1999
Pages
249 - 257
Database
ISI
SICI code
Abstract
The electrochemical deposition of rhodium on Au(111) was studied by means o f in-situ STM and cyclic voltammetry. A phase transition within the [RhCl6] (3-) adlayer was found for Au(111) in 0.1 M H2SO4 + 10(-4) M RhCl3 + 10(-3) M HCl at 520 mV versus SCE, where a (root 13 x root 13)R13.9 degrees-super structure of [RhCl6](3-) is formed on the gold substrate. Rhodium starts to deposit irreversibly around 200 mV versus SCE. First a rhodium bilayer gro ws, the electrochemical behaviour of which is similar to that of a well-ord ered Rh(111) surface. On top of the second rhodium monolayer the formation of small, three-dimensional clusters is observed. The electrocatalytic prop erties of rhodium films with an average thickness up to ten monolayers were studied by using CO oxidation as a test reaction. The influence of the sur face structure on the CO oxidation kinetics is discussed briefly. (C) 1999 Elsevier Science S.A. All rights reserved.