Mutually reactive elements in a glass host matrix: Ag and S ion implantation in silica

Citation
R. Bertoncello et al., Mutually reactive elements in a glass host matrix: Ag and S ion implantation in silica, J MATER RES, 14(6), 1999, pp. 2449-2457
Citations number
45
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS RESEARCH
ISSN journal
08842914 → ACNP
Volume
14
Issue
6
Year of publication
1999
Pages
2449 - 2457
Database
ISI
SICI code
0884-2914(199906)14:6<2449:MREIAG>2.0.ZU;2-A
Abstract
Ag, S, Ag + S, and S + Ag single and double ion implantations in silica gla ss were performed at room temperature. The implantation energies were chose n in order to get a projected range of 40 nm. The fluences were 2 x 10(16) S+ cm(-2) and 5 x 10(16) Ag+ cm(-2) Silver interacts weakly with the host s ilica matrix and forms essentially metallic clusters; this weak interaction between Ag and SiO2 induces formation of silver silicate rather than silve r oxide, Double ion implantations of silver and sulfur lead to chemical int eraction between the two species that is critically influenced by the impla ntation sequence. In particular, in the Ag + S sample silver and sulfur ato ms react to form crystalline core (AE)-shell (Ag2S) nanoclusters.