Nanoscale heterogeneities in amorphous semiconductor(x)metal(1-x) alloys: A small-angle x-ray scattering study

Citation
Js. Rigden et Rj. Newport, Nanoscale heterogeneities in amorphous semiconductor(x)metal(1-x) alloys: A small-angle x-ray scattering study, J MATER RES, 14(4), 1999, pp. 1272-1278
Citations number
26
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS RESEARCH
ISSN journal
08842914 → ACNP
Volume
14
Issue
4
Year of publication
1999
Pages
1272 - 1278
Database
ISI
SICI code
0884-2914(199904)14:4<1272:NHIASA>2.0.ZU;2-X
Abstract
A series of small-angle x-ray scattering (SAXS) experiments has been conduc ted in order to probe further the X-ray absorption fine structure (EXAFS)-d erived nanoscale structure of amorphous hydrogenated silicon(x)tin(1-x), hy drogenated silicon(x)nickell(1-x), and germanium,gold(1-x), materials as a function of metal content. The SAXS results reveal information on cluster f ormation within these reactively radio-frequency-sputtered amorphous thin f ilms. The data are considered within the context of EXAFS data and lend sup port to a model in which the degree and nature of the heterogeneities depen d primarily on the metal species, with the level of metal content inducing additional effects. In particular, the results support a percolation model for the metal:nonmetal transition in amorphous semiconductor,transition met al(1-x), alloys, the conducting volume elements comprising metal or metal c ompound-rich regions within the amorphous tetrahedral host network.