B-C-N compounds were prepared on molybdenum by means of bias-assisted hot f
ilament chemical vapor deposition (HFCVD), Effect of the substrate temperat
ure (T-s) on the growth of B-C-N films has been investigated systematically
by x-ray photoelectron spectroscopy (XPS) and scanning electron microscopy
(SEM) based on the detailed analysis and calculation of the XPS, The subst
rate temperature plays a key role in the formation of the bonding states, t
he composition, and the surface morphology. Boron carbonitride is the main
phase at all depositing temperatures, and the obtained compounds are as fol
lows: B0.83C0.17 +. B0.39C0.35N0.26 at 873 K, B0.30C0.34N0.36 at 973 K, B0.
64C0.36 + B0.51C0.23N0.26 at 1073 K, B0.51C0.31N0.18 at 1173 K, and B0.37C0
.54N0.09 at 1273 K.