Titanium dioxide films were prepared by the sol-gel process at low temperat
ure under dry and humid conditions. The effect of solution parameters on th
e solution reactivity was studied. Layers deposited on silicon wafers as we
ll as on organic substrates were characterized by Fourier Transform infrare
d spectoscopy and ellipsometry. Their mechanical quality was also tested. R
esults reported in this paper demonstrate the influence of the temperature
and humidity during post-deposition treatment on the network development an
d densification. A suitable balance between both mechanisms led to hard and
flexible coatings compatible with the thermal expansion of polymer substra
tes.